Photoresist coating is the first step for patterning of Silicon wafers. We have installed a series of equipment starting from HMDS vapor prime oven, resist spin coater, soft bake and hard bake oven. Substrate sizes from 100mm through 400mm diameter can be coated ranging from 0.3um to 100um thick photoresist depending upon the photoresist in use.  We have some photoresists formulated for broadband, i-Line, KrF, ArF, and Polyimide in our inventory. Also, we will accept customer’s bring-in photoresist or customer’s designated photoresist for coating.