Photoresist coating is the first step for patterning of Silicon wafers. We have installed a series of equipment starting from HMDS vapor prime oven, resist spin coater, soft bake and hard bake oven. Substrate sizes from 200mm through 450mm diameter can be coated ranging from 0.7um to 40um thick photoresist depending upon the photoresist in use. We have some photoresists formulated for broadband, i-Line, and Polyimide in our inventory.